Microwave plasma chemical vapor deposition of graphitic carbon thin films Original Research Article

Thin layers of graphitic carbon were produced from solid organic precursors by a one-step microwave plasma chemical vapor deposition method. Low-pressure Ar-plasma and strong electromagnetic radiation led to the rapid evaporation and pyrolysis of organic precursors at relatively low temperatures, yielding uniform films of nanometer-sized graphitized carbon particles. The structure and morphology of the carbon films were examined using scanning electron microscopy, transmission electron microscopy, and Raman spectroscopy. A direct correlation between electrical conductivity of graphitic thin films and their structure was established.