Role of extended defected SiC interface layer on the growth of epitaxial graphene on SiC Original Research Article

An extended layer of defected SiC has been observed in SiC subjected to heat treatments at 850 and 1050 °C prior to growth of graphene by thermal decomposition. This layer is found to strongly affect the graphene thickness, surface morphology, and Raman spectrum of graphene grown on it. By comparing the strength of the XPS signal associated with this layer it was found that the samples with stronger defected layer signal had the least number of surface pits but also showed the increase in Raman D to G band ratio. The shifts in 2D and G peaks are associated with varying amounts of strain and unintentional doping induced by the SiC defected interface layer, respectively.