Title of article
Restoration of graphene from graphene oxide by defect repair Original Research Article
Author/Authors
Meng Cheng، نويسنده , , Rong Yang، نويسنده , , Lianchang Zhang، نويسنده , , Zhiwen Shi، نويسنده , , Wei Yang، نويسنده , , Duoming Wang، نويسنده , , Guibai Xie، نويسنده , , Dongxia Shi، نويسنده , , Guangyu Zhang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
7
From page
2581
To page
2587
Abstract
A simple and efficient method to repair defects in graphene oxide (GO) is reported, accompanied by a simultaneous reduction process by a methane plasma. The graphene after repair is of high quality. For a typical monolayer after repair and reduction, the minimum sheet resistance at the Dirac point and the Raman D/G peak intensity ratio are about 9.0 kΩ/□ and ∼0.53, respectively.
Journal title
Carbon
Serial Year
2012
Journal title
Carbon
Record number
1124072
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