Rapid thermal pyrolysis of interferometrically patterned resist Original Research Article

In recent years pyrolysis of interferometrically-patterned photoresists has produced three-dimensionally nanopatterned, electrically conductive carbon films with applications from energy storage to biological sensing. We investigate here conditions for rapid thermal pyrolysis that drastically reduce film processing time (from hours to minutes) while preserving the films’ unique nanoscale morphology, film adhesion, and electrochemical properties. We specifically show that heating rate dramatically affects nanoscale morphology, while reducing atmosphere composition, dwell time, and dwell temperature impact the electrochemical performance of these rapidly pyrolyzed nanostructures. Accelerated processing with rapid thermal pyrolysis may facilitate the expanded applicability and rapid fabrication of these promising nanostructured materials.