Title of article :
Influence of N-doping on the structural and photoluminescence properties of graphene oxide films Original Research Article
Author/Authors :
Tran Van Khai، نويسنده , , Han Gil Na، نويسنده , , Dong Sub Kwak، نويسنده , , Yong Jung Kwon، نويسنده , , Heon Ham، نويسنده , , KWANG BO SHIM، نويسنده , , HYOUN WOO KIM، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
8
From page :
3799
To page :
3806
Abstract :
Nitrogen (N) was doped into graphene oxide (GO) films at temperatures of 600–900 °C under the flow of a mixture of NH3 and Ar. The N (atomic) concentration was varied in the range of 3.63–7.45%. XPS and FTIR spectra show that there are mainly single C–N and double Cdouble bond; length as m-dashN bonds in the GO sheet. Raman spectra indicate that the G band becomes closer to the position of the G band of graphite with increasing doping temperature, and thus reveal that N doping produces a blue-shift of the G-band. In room-temperature photoluminescence (PL) spectra, N-doping produces an increase not only in the overall PL intensity, but also in the wavelength of the peak maxima. The shift of the induced PL of N-doped graphene is attributed mainly to the increased number of graphitic (or quaternary) N.
Journal title :
Carbon
Serial Year :
2012
Journal title :
Carbon
Record number :
1124236
Link To Document :
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