Author/Authors :
Cornelius Thiele، نويسنده , , Alexandre Felten، نويسنده , , Tim J. Echtermeyer، نويسنده , , Andrea C. Ferrari، نويسنده , , Cinzia Casiraghi، نويسنده , , Hilbert v. L?hneysen، نويسنده , , Ralph Krupke، نويسنده ,
Abstract :
We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile.
