Computer simulation of dynamics of surface growth Original Research Article

It is shown that limited surface diffusion may strongly modify properties of the film surface. For linear samples, when some analytical results are known for random deposition, the fractal dimension D of the surface is discussed. Model predictions and computer simulation shows that D < 1 for the static case, when assembly of clusters is scanned. The surface is smoother for positive binding energy between atoms, and more rough otherwise. With zero binding energy, analytical results of random growth is recovered.