Title of article :
Different types of scaling in epitaxial growth Original Research Article
Author/Authors :
L. Brendel، نويسنده , , A. Schindler، نويسنده , , M. von den Driesch، نويسنده , , D.E. Wolf، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2002
Pages :
4
From page :
111
To page :
114
Abstract :
Simulation results for (a) interfacial alloying and (b) the Villain instability are presented. Both phenomena are important for the interface structure of epitaxial heterolayers and involve new scaling laws. For (a) a mechanism is discussed, which in a limiting case leads to a concentration profile decaying like (distance from the interface)−2. In (b) the critical film thickness is estimated, at which the Villain instability becomes important. Its scaling with the diffusion constant and the Schwoebel length can be combined with results on the strain dependence of these parameters in order to predict what kind of strains enhance or suppress the instability.
Keywords :
Molecular beam epitaxy , Surface diffusion , Scaling , Interface alloying
Journal title :
Computer Physics Communications
Serial Year :
2002
Journal title :
Computer Physics Communications
Record number :
1135972
Link To Document :
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