Title of article
Different types of scaling in epitaxial growth Original Research Article
Author/Authors
L. Brendel، نويسنده , , A. Schindler، نويسنده , , M. von den Driesch، نويسنده , , D.E. Wolf، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2002
Pages
4
From page
111
To page
114
Abstract
Simulation results for (a) interfacial alloying and (b) the Villain instability are presented. Both phenomena are important for the interface structure of epitaxial heterolayers and involve new scaling laws. For (a) a mechanism is discussed, which in a limiting case leads to a concentration profile decaying like (distance from the interface)−2. In (b) the critical film thickness is estimated, at which the Villain instability becomes important. Its scaling with the diffusion constant and the Schwoebel length can be combined with results on the strain dependence of these parameters in order to predict what kind of strains enhance or suppress the instability.
Keywords
Molecular beam epitaxy , Surface diffusion , Scaling , Interface alloying
Journal title
Computer Physics Communications
Serial Year
2002
Journal title
Computer Physics Communications
Record number
1135972
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