Title of article :
Computational scheme for ab-initio predictions of chemical compositions interfaces realized by deposition growth Original Research Article
Author/Authors :
Jochen Rohrer، نويسنده , , Per Hyldgaard، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2011
Pages :
5
From page :
1814
To page :
1818
Abstract :
We present a novel computational scheme to predict chemical compositions at interfaces as they emerge in a growth process. The scheme uses the Gibbs free energy of reaction associated with the formation of interfaces with a specific composition as predictor for their prevalence. It explicitly accounts for the growth conditions by rate-equation modeling of the deposition environment. The Bell–Evans–Polanyi principle motivates our emphasis on an effective nonequilibrium thermodynamic description inspired by chemical reaction theory. We illustrate the scheme by characterizing the interface between TiC and alumina. Equilibrium thermodynamics favors a nonbinding interface, being in conflict with the wear-resistant nature of TiC/alumina multilayer coatings. Our novel scheme predicts that deposition of a strongly adhering interface is favored under realistic conditions.
Keywords :
Chemical vapor deposition , DFT , CVD , Atomistic modeling , Growth
Journal title :
Computer Physics Communications
Serial Year :
2011
Journal title :
Computer Physics Communications
Record number :
1138336
Link To Document :
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