Title of article :
Microstructure and nanoindentation hardness of Al/Al3Sc multilayers Original Research Article
Author/Authors :
M.A. Phillips، نويسنده , , B.M. Clemens، نويسنده , , W.D. Nix، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2003
Pages :
14
From page :
3171
To page :
3184
Abstract :
In the present paper, we discuss the fabrication, characterization and mechanical properties of a unique multilayer system constructed of aluminum and scandium. Thin film deposition techniques have been used to create high-quality polycrystalline multilayered films consisting of inherently soft Al layers (6–100 nm thick) separated by thin (0.5–5 nm) layers of Al3Sc. We use X-ray diffraction, transmission electron microscopy and in situ wafer curvature to characterize the microstructure and intermixing of the Al/Al3Sc multilayer films produced by sputter deposition for this work. The accompanying hardness results show that layering with nanoscale coherent Al3Sc layers increases the hardness by between 200 and 500% over that of a pure aluminum film.
Keywords :
Hardness , Transmission electron microscopy (TEM) , Multilayer thin films , X-ray diffraction (XRD) , Nanoindentation
Journal title :
ACTA Materialia
Serial Year :
2003
Journal title :
ACTA Materialia
Record number :
1140371
Link To Document :
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