Title of article
A critical assessment of dislocation multiplication laws in germanium Original Research Article
Author/Authors
T. Kruml، نويسنده , , C. Dupas-Bruzek، نويسنده , , J.L. Martin، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2006
Pages
9
From page
4721
To page
4729
Abstract
The issue concerning possible dislocation multiplication laws before the upper yield point of covalent materials is approached in 〈123〉 oriented Ge single crystals using the technique of stress relaxation and transient creep tests. Unlike in metals, relaxation tests exhibit a linear decrease of stress with time and inverse creep is observed. It is shown that these features are the signature of multiplication processes during the transient tests. Attempts at interpreting such particular behaviours are presented using three dislocation multiplication laws proposed in the literature for metals, for covalent crystals in general (based on etch-pit experiments) and for Si (based on computer simulations). The numerical reconstruction of the transient test curves shows that the last law is less satisfactory. This is explained by different stress exponents of the dislocation velocity, close to 1 in Si and to 2 in Ge. A realistic multiplication law should consider the heterogeneity of deformation at the onset of plasticity of these crystals.
Keywords
Dislocation multiplication , Creep tests , Stress-relaxation tests , Elemental semiconductors
Journal title
ACTA Materialia
Serial Year
2006
Journal title
ACTA Materialia
Record number
1142650
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