Title of article :
Size-effect on stress behavior of the AlN/TiN film Original Research Article
Author/Authors :
D. Chen، نويسنده , , Y.M. Wang، نويسنده , , X.L. Ma، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Pages :
7
From page :
2576
To page :
2582
Abstract :
The stress behavior of AlN/TiN superlattice film has been studied by means of a crystal-chemical atomic dynamics simulation based on first-principles calculations. The size-effects on stress behavior are demonstrated and discussed in detail. Stress behavior depends not only on AlN thickness but also on structural relaxation and strain distribution in the film. When the AlN thickness exceeds a critical one, the superlattice film is metastable. Stress behavior can be traced to the AlN/TiN interface structure and its variation with strain relaxation, which may reflect the main strain characteristics caused by AlN structural transformation in this film.
Keywords :
Superlattice , stress , Transformation , simulation
Journal title :
ACTA Materialia
Serial Year :
2009
Journal title :
ACTA Materialia
Record number :
1144243
Link To Document :
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