Title of article
Size-effect on stress behavior of the AlN/TiN film Original Research Article
Author/Authors
D. Chen، نويسنده , , Y.M. Wang، نويسنده , , X.L. Ma، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2009
Pages
7
From page
2576
To page
2582
Abstract
The stress behavior of AlN/TiN superlattice film has been studied by means of a crystal-chemical atomic dynamics simulation based on first-principles calculations. The size-effects on stress behavior are demonstrated and discussed in detail. Stress behavior depends not only on AlN thickness but also on structural relaxation and strain distribution in the film. When the AlN thickness exceeds a critical one, the superlattice film is metastable. Stress behavior can be traced to the AlN/TiN interface structure and its variation with strain relaxation, which may reflect the main strain characteristics caused by AlN structural transformation in this film.
Keywords
Superlattice , stress , Transformation , simulation
Journal title
ACTA Materialia
Serial Year
2009
Journal title
ACTA Materialia
Record number
1144243
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