Title of article :
Growth mechanism of Ni3Sn4 in a Sn/Ni liquid/solid interfacial reaction Original Research Article
Author/Authors :
J. Shen، نويسنده , , Y.C. Chan، نويسنده , , George S.Y Liu ، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Pages :
11
From page :
5196
To page :
5206
Abstract :
The chemical interfacial reaction of Ni plates with eutectic Sn–3.5Ag lead-free solder was studied by microstructural observations and mathematical calculations. Compared with the Sn–3.5Ag–0.75Ni/Ni interfacial reaction, based on a simple model of the growth of the liquid/solid chemical compound layer, the growth mechanism of Ni3Sn4 in the Sn–3.5Ag/Ni interfacial reaction is discussed and presented. The growth process of Ni3Sn4 in the Sn/Ni liquid/solid reaction interface involves the net effect of several interrelated phenomena, such as volume diffusion, grain boundary diffusion, grain boundary grooving, grain coarsening, and dissolution into the molten solder. The growth time exponent n and morphology of Ni3Sn4 were found to be dependent on these factors.
Keywords :
Interfacial reaction , Sn/Ni , Growth mechanism , Microstructure
Journal title :
ACTA Materialia
Serial Year :
2009
Journal title :
ACTA Materialia
Record number :
1144504
Link To Document :
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