Title of article
Dominant shallow donors in zinc oxide layers obtained by low-temperature atomic layer deposition: Electrical and optical investigations
Author/Authors
Tomasz A. Krajewski، نويسنده , , Krzysztof Dybko، نويسنده , , Grzegorz Luka، نويسنده , , Elzbieta Guziewicz، نويسنده , , Piotr Nowakowski، نويسنده , , Bartlomiej S. Witkowski، نويسنده , , Rafal Jakiela، نويسنده , , Lukasz Wachnicki، نويسنده , , Agata Kaminska، نويسنده , , Andrzej Suchocki، نويسنده , , Marek Godlewski، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2014
Pages
7
From page
69
To page
75
Abstract
This work is focused on the electrical and optical analyses used to estimate the activation energy of the dominant shallow donor in thin ZnO films obtained at low temperature by the atomic layer deposition process. These two approaches, based on the temperature-dependent classical Hall effect and photoluminescence investigations, yielded a donor activation energy ED in the range of 30–40 meV, including the estimated error margins. This value, as confirmed by layer composition studies, is attributed to the presence of zinc atoms in the interstitial positions of the ZnO lattice.
Keywords
Defects , Atomic layer deposition , Electrical conductivity (n-type) , Thin films , Zinc oxide
Journal title
ACTA Materialia
Serial Year
2014
Journal title
ACTA Materialia
Record number
1147494
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