Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Thin films of tungsten-doped vanadium(IV) oxide were prepared on glass substrates from the atmospheric pressure chemical vapor deposition of vanadium(IV) chloride, tungsten(VI) ethoxide, and water at 500-600 C. The films were characterized by Raman microscopy, glancing angle X-ray diffraction (GAXRD), X-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS), scanning electron microscopy (SEM), and vis\IR reflectance-transmittance. The films showed a reduction in thermochromic transition temperatures from 68 C in VO2 to 42 C in V0.99W0.01O2 -approaching that required for commercial use as an intelligent window coating.