Title of article
Film Morphology and Thin Film Transistor Performance of Solution-Processed Oligothiophenes
Author/Authors
Frechet، Jean M. J. نويسنده , , Chang، Paul C. نويسنده , , Lee، Josephine نويسنده , , Huang، Daniel نويسنده , , Subramanian، Vivek نويسنده , , Murphy، Amanda R. نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2004
Pages
-4782
From page
4783
To page
0
Abstract
The relationship between film morphology and thin film transistor (TFT) performance was investigated for two symmetrical (alpha),(omega)-substituted sexithiophene derivatives containing thermally removable solubilizing groups. Solution deposition methods such as spin-coating, dip-casting, and inkjet-printing were optimized for solvent and annealing temperatures, and several substrate surface treatments were explored. The resulting thin films were characterized with AFM and the observed semiconductor performance was found to correlate with the morphology of the films, with the most crystalline films exhibiting the highest performance. Devices showed overall mobilities as high as 0.07 cm^2/V s with on/off ratios > 10^8, which are among the highest reported values for oligothiophenes solution cast at room temperature.
Keywords
Sulphur dioxide , isoprene , isoprene oxidation , atmospheric VOC , inhibition of S(IV) autoxidation
Journal title
CHEMISTRY OF MATERIALS
Serial Year
2004
Journal title
CHEMISTRY OF MATERIALS
Record number
115683
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