Title of article :
EKV3 compact modeling of MOS transistors from a 0.18 μm CMOS technology for mixed analog–digital circuit design at low temperature Original Research Article
Author/Authors :
P. Martin، نويسنده , , H. CLAESSENS and M. CAVELIER، نويسنده , , R. Fascio، نويسنده , , G. Ghibaudo، نويسنده , , M. Bucher، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Abstract :
The standard version of the EKV3 compact model is evaluated for simulation of mixed analog–digital circuits working at low temperature (77–200 K). This evaluation is performed on a dual gate oxide CMOS technology with 0.18 μm/1.8 V and 0.35 μm/3.3 V MOSFET transistors. A detailed temperature analysis of some physical effects is performed. Specific effects, such as anomalous narrow channel effect, freeze-out in Lightly Doped drain (LDD) regions or quantization of the inversion charge, are observed at low or intermediate temperature. Some improvements of this compact model will allow a more accurate description of MOS transistors at low temperature.
Keywords :
MOSFET , EKV3 compact model , Low temperature
Journal title :
Cryogenics
Journal title :
Cryogenics