Surface nitriding of titanium in arc plasma

Titanium substrates were nitrided in a pot type arc plasma furnace in the temperature range 1400–1500 °C under different gas (Ar, N2, H2) mixture plasma for 15 min each. The nitrided surfaces were characterized by X-ray diffraction and scanning electron microscopy. Depth of nitride layer grown was found to vary between 100 and 120 micons. The major compound phases to grow by this method were identified to be Ti2N, α-TiN and ε-TiN, etc. Experimental details and characterization of arc plasma nitrided titanium are reported and discussed.