Title of article :
Photocatalytic activity of doped TiO2 coatings prepared by sputtering deposition
Author/Authors :
Sung-Mao Chiu، نويسنده , , Chris Zhisheng Chen، نويسنده , , Kuo-Yuan Yang، نويسنده , , Yu-Lung Hsu، نويسنده , , Dershin Gan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
8
From page :
60
To page :
67
Abstract :
Nitrogen-doped titanium oxide films were deposited at different N2/O2 flow ratios by dc reactive magnetron sputtering. The films were characterized using grazing incidence X-ray diffraction, scanning electron microscopy, AFM, and UV–vis-NIR spectrophotometer. Photocatalytic activities of the samples were evaluated by the degradation of methylene blue. Experimental results have demonstrated that all the films show anatase (1 0 1) preferred orientation and the crystallinity of TiO2 − xNx films decreases as increasing the nitrogen flow rate. The proper N2/O2 flow ratio condition results in the band gap narrowing and a red shift in the absorption spectra toward visible light regions. The TiO2 − xNx film with high crystallinity and porous surface morphology shows the better degradation rate of methylene blue solution increases about two times than TiO2 films.
Keywords :
Physical vapor deposition , Nitrogen doping , Photocatalytic activity , Titanium oxide
Journal title :
Journal of Materials Processing Technology
Serial Year :
2007
Journal title :
Journal of Materials Processing Technology
Record number :
1181229
Link To Document :
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