Title of article
Impurity removal and overall rate constant during low pressure treatment of liquid silicon
Author/Authors
Aleksandar M. Mitra?inovi?، نويسنده , , Ryan DʹSouza، نويسنده , , Torstein A. Utigard، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
5
From page
78
To page
82
Abstract
The research presented analyzes the effect of low pressure on the amount and reduction of impurity elements in upgraded metallurgical grade silicon. The achieved pressure was 5 kPa in the commercial electro-resistance furnace in the magnesia and mullite refractory material. The chemical composition was determined by ICP-MS method. Elements such as Al, Fe, Mn, Cu or Zn had the highest evaporation rates where higher evaporation was achieved at higher melt temperatures. The overall rate constant was deduced for four melt temperatures indicating high values even for low melt temperatures. The interfacial boundary between Si and mullite refractory showed no dissolution of Al into the liquid Si.
Keywords
Si , Refining , Low pressure , Evaporation , Rate constant , Impurity
Journal title
Journal of Materials Processing Technology
Serial Year
2012
Journal title
Journal of Materials Processing Technology
Record number
1184298
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