Title of article
An analytical thermal resistance model for calculating mean die temperature of a typical BGA packaging
Author/Authors
Xiaobing Luo، نويسنده , , Zhangming Mao، نويسنده , , Jv Liu، نويسنده , , Sheng Liu، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2011
Pages
9
From page
208
To page
216
Abstract
An analytical thermal resistance network model is developed for calculating mean die temperature of a typical BGA packaging. The thermal resistance network is established based on heat dissipation paths from die to ambient. Every thermal resistance in the network can be calculated by analytical expressions. The proposed model is applied to a typical BGA packaging. Simulations to obtain the die temperature of the packaging were also done by COMSOL. The data comparison shows that the mean die temperatures calculated by the present model are very close to the ones obtained by simulations. It is demonstrated that the proposed model can be used to predict the mean die temperature of BGA packaging accurately. This proposed model is simple and resource-saving for the semi-conductor industry to predict the mean die temperature of typical BGA packaging and also it provides an optimization method to choose materials for good thermal management of BGA packaging.
Keywords
Thermal resistance model , Analytical solution , Mean die temperature
Journal title
Thermochimica Acta
Serial Year
2011
Journal title
Thermochimica Acta
Record number
1201723
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