Title of article :
Humic acid degradation in aqueous solution by the photo-Fenton process
Author/Authors :
KANECO، SATOSHI نويسنده , , OHTA، KIYOHISA نويسنده , , Katsumata، Hideyuki نويسنده , , Suzuki، Tohru نويسنده , , Maki، Sada نويسنده , , Yobiko، Yoshihiro نويسنده ,
Issue Information :
روزنامه با شماره پیاپی 2 سال 2008
Abstract :
The photodegradation of humic acid (HA) was carried out in the presence of the Fenton reagent. The absorbance decrease of HA was strongly
influenced by the pH, and initial concentrations of H2O2 and Fe(II). An initial absorbances of HA (10 mg L^−1) in 254 and 400 nm were completely
disappeared after 8 h under the optimum conditions. The decrease of TOC as a result of mineralization of HA was observed during the photo-
Fenton process. The degree of HA mineralization was about 80% under UV irradiation after 15 h. The molecular weight distribution changes of
HA were evaluated by high performance size exclusion chromatography (HPSEC). The large molecular weight component in HA appears to be
easily degraded by the photo-Fenton process than the smaller components. Furthermore, the photo-Fenton process was successfully applied to the
degradation of HA in sea sediment of Ago Bay, Mie Prefecture, Japan. Based on these results, the photo-Fenton reaction could be useful technology
for the treatment of environmental sample contaminated by HA.
Keywords :
Photo-Fenton reaction , Degradation , mineralization , Humic acid , High performance size exclusion chromatography
Journal title :
Chemical Engineering Journal
Journal title :
Chemical Engineering Journal