Author/Authors :
Wen-Chun Wu، نويسنده , , Li-Fen Liao، نويسنده , , Chih-Chung Chuang، نويسنده , , Jong-Liang Lin *، نويسنده ,
Abstract :
Adsorption and photooxidation of formamide on TiO2 have been studied by Fourier-transformed infrared spectroscopy. Formamide is adsorbed with intact molecular form (HCONH2(a)) and dissociative form (η2(N,O)-HCONH) on the surface at 35°C. They are subject to decomposition upon UV illumination in O2. Adsorbed isocyanate (NCO) and formate (HCOO) and gaseous CO2 and N2O are formed in the photooxidation. CO2 formation mainly results from NCO(a) photodecomposition.
