Title of article
Coverage of palladium by silicon oxide during reduction in H2 and complete oxidation of methane
Author/Authors
Guanghui Zhu، نويسنده , , Ken-ichiro Fujimoto، نويسنده , , Dmitri Yu. Zemlyanov، نويسنده , , Abhaya K. Datye، نويسنده , , Fabio H. Ribeiro، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
9
From page
170
To page
178
Abstract
The interaction between silica and palladium following complete oxidation of methane or following reduction in H2 was investigated on a polycrystalline palladium foil and on supported Pd/SiO2 catalysts. During methane oxidation, oxidized silicon covered the palladium oxide surface as observed by TEM on Pd/SiO2 catalysts and by XPS on palladium foil. On the Pd foil, the source of silica was a silicon impurity, common on bulk metal samples. The migration of oxidized silicon onto PdO deactivated the catalysts by blocking the active sites for methane oxidation. Silicon oxide overlayers were also observed covering the Pd surface after reduction of Pd/SiO2 by H2 at 923 K.
Keywords
Mesoporous material , Isopulegol , Acidity , cyclization
Journal title
Journal of Catalysis
Serial Year
2004
Journal title
Journal of Catalysis
Record number
1223164
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