Title of article :
Polymers in conventional and alternative lithography for the fabrication of nanostructures
Author/Authors :
Canet Acikgoz، نويسنده , , Mark A. Hempenius، نويسنده , , Jurriaan Huskens، نويسنده , , G. Julius Vancso، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Abstract :
This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies.
Keywords :
Polymer resists , Conventional lithography , Alternative lithography , patterning , Colloidal assembly , Nanoimprint lithography
Journal title :
European Polymer Journal(EPJ)
Journal title :
European Polymer Journal(EPJ)