• Title of article

    Influence of fabrication parameter on the nanostructure and photoluminescence of highly doped p-porous silicon

  • Author/Authors

    Shaoyuan Li، نويسنده , , Wenhui Ma، نويسنده , , Yang Zhou، نويسنده , , Xiuhua Chen، نويسنده , , Mingyu Ma، نويسنده , , Yongyin Xiao، نويسنده , , Yaohui Xu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2014
  • Pages
    7
  • From page
    76
  • To page
    82
  • Abstract
    Porous silicon (PS) was prepared by anodizing highly doped p-type silicon in the solution of H2O/ethanol/HF. The effects of key fabrication parameters (HF concentration, etching time and current density) on the nanostructure of PS were carefully investigated by AFM, SEM and TEM characterization. According to the experimental results, a more full-fledged model was developed to explain the crack behaviors on PS surface. The photoluminescence (PL) of resulting PS was studied by a fluorescence spectrophotometer and the results show that PL peak positions shift to shorter wavelength with the increasing current density, anodisation time and dilution of electrolyte. The PL spectra blue shift of the sample with higher porosity is confirmed by HRTEM results that the higher porosity results in smaller Si nanocrystals. A linear model (λPL/nm=620.3–0.595P, R=0.905) was established to describe the correlation between PL peak positions and porosity of PS.
  • Keywords
    Porosity-PL peak shift , Porous silicon , structure characterization , Crack behaviors , Photoluminescence
  • Journal title
    Journal of Luminescence
  • Serial Year
    2014
  • Journal title
    Journal of Luminescence
  • Record number

    1263550