Title of article
Time dependence of secondary electron yield and of surface potential during charging of amorphous silica target
Author/Authors
B. Askri، نويسنده , , K. Raouadi، نويسنده , , R. Renoud، نويسنده , , B. Yangui، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
8
From page
695
To page
702
Abstract
We study herein the charge evolution of a silica amorphous target submitted to an electronic bombardment. During the bombardment, the injected electronic charge and the primary energy as well as the surface bombardment of the target are controlled. The dynamics of the injected charge are described by combining measurements of the secondary electron and X-ray emission using a scanning electron microscope. Thus, we are able to access the evolution of the surface potential and secondary electron yield. Monte-Carlo calculations are used to simulate situations similar to our experiences and to study the effect of certain parameters (density of traps, energy of activation) inaccessible to the measures with our devices.
Keywords
Dielectricbreakdown , Space-chargeeffects , Secondaryemission
Journal title
JOURNAL OF ELECTROSTATICS
Serial Year
2009
Journal title
JOURNAL OF ELECTROSTATICS
Record number
1265138
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