ZnO thin films produced by magnetron sputtering

ZnO thin films were deposited onto glass substrates with direct current (dc) or radio frequency (rf) magnetron sputtering using Zn or ZnO target. SEM and XRD analysis demonstrated that the type of deposition mode, plasma excitation, working pressure and oxygen partial pressure, bias, working distance, and doping could significantly change the quality and microstructure of the films. The electrical conductivity of ZnO films is strongly affected by the deposition mode (dc or rf), crystal structure, chemical composition and microstructure. Photoluminescence of these films were also studied, and the relationships of processing parameters, microstructure, and properties were explored.