Microstructure of LaNiO3 thin films obtained by the spin-on technique from citrate precursors

The morphology of perovskite LaNiO3 (LNO) thin films is a very important feature considering the fact that they could be used as an electrode material in ferroelectric devices. In this work, LNO films were prepared from citrate precursors. The films were deposited on Si (100) and Pt covered Si substrates [Pt (111)/Ti/SiO2/Si] using the spin-on technique. The phase composition of the films was confirmed by X-ray powder diffraction analysis, while the microstructures were investigated by atomic force microscopy. The influence of the metal ion:citric acid:ethylene glycol ratio on the morphology of the films was investigated. After optimization of these parameters, very homogenous, uniform and crack-free LNO films were obtained.