Title of article :
Al thermomigration applied to the formation of deep junctions for power device insulation
Author/Authors :
Dilhac، J-M. نويسنده , , Cornibert، L. نويسنده , , Ganibal، C. نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
-22
From page :
23
To page :
0
Abstract :
An alternative method for creating total vertical junction insulation of power devices is presented. It involves the thermomigration of melted Al/Si. The method is first theoretically presented together with the specifically designed rapid thermal processor used in the experiments. Physical and electrical results are then given showing the efficiency of the method in terms of thermal budget, surface consumption and voltage handling capability. The issue of manufacturability is finally addressed.
Keywords :
Form error , Roundness , tolerance , Circlilarity , Min-Max
Journal title :
MICROELECTRONICS RELIABILITY
Serial Year :
1999
Journal title :
MICROELECTRONICS RELIABILITY
Record number :
12827
Link To Document :
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