Title of article
High electrical resistivity of CVD-diamond
Author/Authors
Manca، J.V. نويسنده , , Nesladek، M. نويسنده , , Neelen، M. نويسنده , , Quaeyhaegens، C. نويسنده , , Schepper، L. De نويسنده , , Ceuninck، W. De نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
-268
From page
269
To page
0
Abstract
Due to its combination of excellent thermo-mechanical properties and electrical properties such as the high electrical resistivity and high dielectric strength, diamond seems a promising material for specialized dielectric applications. Due to the great advances in the growth technology of diamond films by chemical vapour deposition (CVD) on e.g. Si-substrates, new applications can be expected in microelectronics. An important technological result for dielectric applications is that high electrical resistivity diamond films can be obtained after an appropriate heat treatment of the as-grown films.
Keywords
Dynamic thermal modeling of IC packages , Thermal benchmark IC , Measuring of thermal coupling in ICs
Journal title
MICROELECTRONICS RELIABILITY
Serial Year
1999
Journal title
MICROELECTRONICS RELIABILITY
Record number
12891
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