Title of article :
Experiences on reliability simulation in the framework of the PROPHECY project
Author/Authors :
Rempp، Horst نويسنده , , Thalau، Oliver نويسنده , , Scorzoni، Andrea نويسنده , , Ghilbaudo، Gerard نويسنده , , Vincent، Emanuel نويسنده , , Minehane، Sean نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
-660
From page :
661
To page :
0
Abstract :
Electromigration and oxide time dependent dielectric breakdown simulations based on library elements of a 0.35 (mu).m CMOS technology have been performed. In the case of hot carrier degradation simulations as well as experiments using 99-stage ring oscillators of the same 0.35 (mu)m CMOS technology have been carried out and compared. The frequency behaviour as a function of supply voltage and temperature has been investigated. Relaxation effects on the ring oscillators have been found. These effects are not covered by the reliability simulation tool. In a certain region of supply voltage and operation time the results of simulations could be confirmed by experiments. In all other cases the measured frequency degradation was smaller than the simulated degradation. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Microstructural analysis , Aluminum alloys , Resistance measurements , Electromigration
Journal title :
MICROELECTRONICS RELIABILITY
Serial Year :
1999
Journal title :
MICROELECTRONICS RELIABILITY
Record number :
12971
Link To Document :
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