Title of article :
Assessment of worst case dielectric failure rate based on statistical samples with pure intrinsic failure distributions
Author/Authors :
Kerber، Martin نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
Assessment of failure rates of integrated MOS circuits on basis of accelerated reliability testing is investigated. A procedure is proposed to predict an upper limit of dielectric failure rates for arbitrary cumulative breakdown distributions. This allows to derive a worst case number in any variety of experimental results. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
Journal title :
MICROELECTRONICS RELIABILITY
Journal title :
MICROELECTRONICS RELIABILITY