Title of article
Advanced failure detection techniques in deep submicron CMOS integrated circuits
Author/Authors
Rubio، Antonio نويسنده , , Altet، Josep نويسنده , , Mateo، Diego نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
-908
From page
909
To page
0
Abstract
The test of present integrated circuits exhibits many confining aspects, among them the adequate selection of the observable variables, the use of combined testing approaches, an each time more restricted controllability and observability (physically and electrically) and finally the required testing time. In the paper these points are discussed and different nowadays-promising techniques exposed. Complementarily to the logic output variable analysis (both value and delay) three efficient detection and localisation techniques can be considered that are contemplated in this work: the detection of light, heat and leakage currents due to the presence of failures. In most of the cases it is not possible to differentiate clearly, like was in the past, the production testing, the in-field testing, the test and the localisation of the failure, making each time closer the fields of testing and failure analysis. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords
Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
Journal title
MICROELECTRONICS RELIABILITY
Serial Year
1999
Journal title
MICROELECTRONICS RELIABILITY
Record number
13040
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