Characterization of electrodeposited nickel film surfaces using atomic force microscopy Original Research Article

Microstructures of nickel surfaces electrodeposited on indium tin oxides coated glasses are investigated using atomic force microscopy. The fractal dimension D and Hurst exponent H of the nickel surface images are determined from a frequency analysis method proposed by Aguilar et al. [J. Microsc. 172 (1993) 233] and from Hurst rescaled range analysis. The two methods are found to give the same value of the fractal dimension D∼2.0. The roughness exponent α and growth exponent β that characterize scaling behaviors of the surface growth in electrodeposition are calculated using the height-difference correlation function and interface width in Fourier space. The exponents of α∼1.0 and β∼0.8 show that the surface growth does not belong to the universality classes theoretically predicted by statistical growth models.