Author/Authors :
Hae-Seok Lee، نويسنده , , Hiroshi Okada، نويسنده , , Akihiro Wakahara، نويسنده , , Takeshi Ohshima، نويسنده , , Hisayoshi Itoh، نويسنده , , Shirou Kawakita، نويسنده , , Mitsuru Imaizumi، نويسنده , , Sumio Matsuda، نويسنده , , Akira Yoshida، نويسنده ,
Abstract :
3 MeV electron irradiation induced-defects in CuInSe2 (CIS) thin films have been investigated. Both of the carrier concentration and Hall mobility were decreased as the electron fluence exceeded 1×1017 cm−2. The carrier removal rate was estimated to be about 1 cm−1. To evaluate electron irradiation-induced defect, the electrical properties of CIS thin films before and after irradiation were investigated between 80 and 300 K. From the temperature dependence of the carrier concentration in non-irradiated thin films, we obtained ND=1.8×1017 cm−3, NA=1.7×1016 cm−3 and ED=18 meV from the SALS fitting to the experimental data on the basis of the charge balance equation. After irradiation, a new defect level was formed, and NT0=1.4×1017 cm−3 and ET=54 meV were also obtained from the same procedure. From the temperature dependence of Hall mobility, the ionized impurity density was discussed before and after the irradiation.