Title of article :
Electrochemical characteristics of alumina dielectric layers Original Research Article
Author/Authors :
Han-Jun Oh، نويسنده , , Yongsoo Jeong، نويسنده , , Su-Jung Suh، نويسنده , , Young Jik Kim and In Hag Choi، نويسنده , , Choong-Soo Chi، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
7
From page :
2219
To page :
2225
Abstract :
The electrochemical characteristics of alumina dielectric layers were studied using a surface roughness factor and an impedance spectroscopy. From the limiting diffusion current method, the surface area factor of the dielectric anodic layer with low electrical conductivity was estimated to be 1.03. As alumina dielectric films on Al have a variable stoichiometry, the electrochemical behavior of Al2O3 layer can be monitored by evaluating an equivalent circuit with Young impedance of dielectric constant with a vertical decay of conductivity.
Keywords :
Transmission electron microscopy , Electrochemical impedance spectroscopy , Electrolytic capacitor , Aluminum oxide , Rutherford backscattering spectrometry
Journal title :
Journal of Physics and Chemistry of Solids
Serial Year :
2003
Journal title :
Journal of Physics and Chemistry of Solids
Record number :
1308446
Link To Document :
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