Title of article :
Cathodoluminescence from hot electron stressed InP HEMTs
Author/Authors :
Cova، Paolo نويسنده , , Meneghesso، Gaudenzio نويسنده , , Salviati، Giancarlo نويسنده , , Zanoni، Enrico نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
-1072
From page :
1073
To page :
0
Abstract :
For the first time in our knowledge a correlation between hot electrons induced degradation and cathodoluminescence (CL) signal in InAlAs/InGaAs/InP HEMTs has been found. The SEM CL spectra of stressed devices reveal a clear reduction in the intensity of the signal collected from the gate-drain region, which confirms the hypothesis of traps development in such region, already supported by changes in the electrical characteristics. This technique can then be used for physical investigation of the hot electron stress damage induced in inP based HEMTs. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Electromigration , Aluminum alloys , Resistance measurements , Microstructural analysis
Journal title :
MICROELECTRONICS RELIABILITY
Serial Year :
1999
Journal title :
MICROELECTRONICS RELIABILITY
Record number :
13093
Link To Document :
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