Title of article
The morphology of etch pits on a sapphire surface Original Research Article
Author/Authors
Che-Ming Liu، نويسنده , , Jyh-Chen Chen، نويسنده , , Yi-Cheng Huang، نويسنده , , Hung-Lin Hsieh، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
572
To page
575
Abstract
In this work, the pits were successfully etched onto (0 0 0 1) or (View the MathML source112¯0) sapphire single crystal surfaces by using a Na2B4O7 solution. The difference in the morphology of etch pits on different planes of the sapphire was examined by atomic force microscopy measurements. It was found that the size of the etch pits was affected by the etching duration. The results of X-ray diffraction analysis also indicated the particular in-plane orientation of the etch pits on the sapphire surface. The relationship between the morphology of etch pit and the sapphire structure will be explained in the paper. In addition, the etching rates for the (0 0 0 1) and (View the MathML source112¯0) types of sapphire will be compared.
Keywords
A. Oxides , D. Crystal structures , D. Defects
Journal title
Journal of Physics and Chemistry of Solids
Serial Year
2008
Journal title
Journal of Physics and Chemistry of Solids
Record number
1310087
Link To Document