Comparative study of the p+ layer created in CdTe films by nitric–phosphoric etching and chemical-deposition methods

The physical properties of the etched CdTe surfaces obtained during the process of formation of a p+ region on CdTe surface films using (i) a nitric/phosphoric acid mixture and (ii) a chemical Te-deposition method involving thermal annealing have been compared in this study. This study suggests the chemical-deposition method as an alternative to the chemical-etching methods for use in back-contact technology to increase the efficiency of CdTe solar cells.