• Title of article

    Introductory invited paper On the extraction of the source and drain series resistances of MOSFETs

  • Author/Authors

    Liou، J.J. نويسنده , , Sanchez، F.J. Garcia نويسنده , , Ortiz-Conde، A. نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    -1172
  • From page
    1173
  • To page
    0
  • Abstract
    This article reviews and scrutinizes various proposed methods to extract the individual values of drain and source resistances (R(D)) and R(S)) of MOSFETs, which are important device parameters for modeling and circuit simulation. In general, these methods contain three basic steps: (1) the extraction of the total drain and source resistance (R(D) + R(s)) (2) the extraction of the difference between the drain and the source resistances (R(D) - RS)ʹ,and (3) the calculation of R(D) and R(s) from the knowledge of (R(D) + R(s)) and (RD - Rs). These methods are tested and compared in the environments of circuit simulator, device simulation and measurements, (C) 1999 Elsevier Science Ltd. All rights reserved.
  • Keywords
    Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
  • Journal title
    MICROELECTRONICS RELIABILITY
  • Serial Year
    1999
  • Journal title
    MICROELECTRONICS RELIABILITY
  • Record number

    13128