Trimethylphosphite stabilized N-silver(I) succinimide complexes as CVD precursors

The preparation of [(MeO)3Pn·AgNC4H4O2] (n = 1, 2a; n = 2, 2b) is described. The molecular structure of 2a was determined by using X-ray single crystal analysis. Complex 2b was tested as Metal Organic Chemical Vapor Deposition (MOCVD) precursor in the deposition of silver for the first time. The thin films obtained were characterized using scanning electron microscopy (SEM) and energy-dispersion X-ray analysis (EDX). SEM and EDX studies show that the dense and homogeneous silver films could be obtained.