Title of article :
Modeling electromigration as a fluid-gas system
Author/Authors :
Schoenmaker، Wim نويسنده , , Petrescu، Violeta نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
-1666
From page :
1667
To page :
0
Abstract :
In this paper two problems in modeling electromigration are addressed. The first problem is an issue of principle concerning counting the number of variables and the number of equations for formulating a well-posed mathematical problem. The second problem deals with setting up a system of equations which are sufficiently detailed for performing computer simulations of the local dynamics governing electromigration phenomena, and which also keep the CPU consumption within acceptable limits. A model for electromigration, which is based on a fluid-gas picture for the material transport, is proposed for dealing with both questions. The flow of matter is described as a combined flow of lattice sites and a flow of vacancies. The gas component is used to describe the vacancy flux. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Interconnects , Electromigration , Saturation
Journal title :
MICROELECTRONICS RELIABILITY
Serial Year :
1999
Journal title :
MICROELECTRONICS RELIABILITY
Record number :
13208
Link To Document :
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