Title of article :
The defect chemistry of nitrogen in oxides: A review of experimental and theoretical studies
Author/Authors :
Jonathan M. Polfus، نويسنده , , Truls Norby، نويسنده , , Reidar Haugsrud، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Abstract :
Incorporation of nitrogen into oxides has in recent years received increased attention as a variable for tuning their functional properties. A vast number of reports have been devoted to improving the photocatalytic properties of TiO2, p-type charge carrier concentration in ZnO and the ionic transport properties of ZrO2 by nitrogen doping. In comparison, the fundamentals of the nitrogen related defect chemistry for a wider range of oxides have been less focused upon. In the present contribution, we review experimental and computational investigations of the nitrogen related defect chemistry of insulating and semiconducting oxides. The interaction between nitrogen and protons is important and emphasized. Specifically, the stability of nitrogen defects such as View the MathML sourceNO/, View the MathML sourceNHO× and View the MathML source(NH2)O• is evaluated under various conditions and their atomistic and electronic structure is presented. A final discussion is devoted to the role of nitrogen with respect to transport properties and photocatalytic activity of oxides.
Keywords :
Nitrogen defects , Oxides , Nitrides , Protons , Diffusion , Electronic structure
Journal title :
JOURNAL OF SOLID STATE CHEMISTRY
Journal title :
JOURNAL OF SOLID STATE CHEMISTRY