Title of article
Mechanism of chemical sputtering of graphite under high flux deuterium bombardment
Author/Authors
Ueda، نويسنده , , Y and Sugai، نويسنده , , T and Ohtsuka، نويسنده , , Y and Nishikawa، نويسنده , , M، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
7
From page
216
To page
222
Abstract
Chemical sputtering of graphite materials (isotropic graphite and carbon fiber composite) was studied by irradiation of 5 keV D3+ beam with a flux up to 4×1021 m−2 s−1, which is more than one order magnitude higher than previous low flux beam experiments (<1020 m−2 s−1). The chemical sputtering yield was obtained from measurements of the released methane signal with a quadrupole mass analyser. It was found that the methane yield at peak temperatures is almost independent of flux from 5×1020 to 4×1021 m−2 s−1. Peak temperatures range between 900 and 1000 K, which is higher than those of the previous low flux experiments (<900 K, <1020 m−2 s−1). By comparing our experimental results with calculation results based on Rothʹs model, the annealing effect of radiation damage to prevent methyl group formation appears to be unimportant.
Journal title
Journal of Nuclear Materials
Serial Year
2000
Journal title
Journal of Nuclear Materials
Record number
1347073
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