Mixed material formation and erosion

The formation of mixed phases on materials relevant for first wall components of fusion devices is studied under well-defined conditions in ultra-high vacuum (UHV). This is necessary in order to determine fundamental parameters governing the basic processes of chemical reaction, material mixing and erosion. We examined the binary systems comprising of the wall materials beryllium, silicon, tungsten and titanium and carbon, the latter being both a wall material and a plasma impurity. Experiments were carried out to study the interaction of carbon in the form of a vapor-deposited component on clean, well-defined elemental surfaces. The chemical composition and the binding state are measured by X-ray photoelectron spectroscopy (XPS) after annealing treatments. For all materials, a limited carbide formation is found at room temperature. Annealing carbon films on elemental substrate leads to a complete carbidization of the carbon layer. The carbide layers on Be and Si are stable even at very high temperatures, whereas the carbides of Ti and W dissolve. The erosion of these two metals by sputtering is then identical to the pure metals, whereas for Be and Si a protective carbide layer can reduce the sputtering yields.