Title of article :
Chemical erosion of boronized films from DIII-D tiles
Author/Authors :
Davis، نويسنده , , J.W. and Wright، نويسنده , , P.B. and Macaulay-Newcombe، نويسنده , , R.G. and Haasz، نويسنده , , A.A. and Hamilton، نويسنده , , C.G.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
Tile specimens from the DIII-D tokamak have been studied to determine their erosion characteristics when exposed to D+ ions and O2 gas. Here, we report results for tile surfaces from the outer midplane. Surface analyses (EDX, XPS, SIMS) indicate that the surface layer is composed primarily of boron, with an overlayer of a B/C mixture. Total hydrocarbon (ΣCiDj) erosion yields were initially found to be ∼0.01–0.02 C/D+, with limited variations due to D+ energy (50 or 200 eV) or specimen temperature (300–700 K). Erosion yields were seen to decrease with fluence by a factor of 1.5–2 over the range ∼4×1021–3×1022 D+/m2. Above ∼3×1022 D+/m2 the yields level off. The initial erosion yields are found to be consistent with those for boron-doped graphite. O2 gas exposure at 523 or 623 K initially removed ∼25% of the trapped D; however, the remaining D could not be removed by baking in O2 at temperatures up to 623 K.
Keywords :
Co–deposition , Boronization , Boronized carbon film , Chemical erosion , DIII-D
Journal title :
Journal of Nuclear Materials
Journal title :
Journal of Nuclear Materials