Title of article
Surface segregation and oxidation of Ti in a V–Ti alloy
Author/Authors
Hayakawa، نويسنده , , Ryo and Hatano، نويسنده , , Yuji and Fujii، نويسنده , , Katsuhiko and Fukumoto، نويسنده , , Ken-ichi and Matsui، نويسنده , , Hideki and Watanabe، نويسنده , , Kuniaki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
580
To page
584
Abstract
The oxidation and reduction of surface oxides of the V–4%Ti alloy were examined by X-ray photoelectron spectroscopy. A specimen sheet of the alloy covered by oxide films was heated between 513 and 1223 K for 10 min in vacuum. Vanadium oxides started to be reduced to the metallic state at 673 K owing to oxygen dissolution in the bulk, while titanium remained in oxidized states up to 983 K. Titanium segregated to the surface above this temperature, and the surface concentration reached up to 40% at 1223 K. The specimen surface enriched in Ti was thus prepared and oxidized at 573 and 773 K under oxygen pressures between 10−5 and 10−3 Pa. At 573 K, titanium was selectively oxidized at 10−5 Pa, while vanadium remained in a metallic state. Such selective oxidation of Ti took place also at 775 K under the pressure of 10−4 Pa. Titanium segregating to the surface appeared to provide the barrier effect against tritium inventory and permeation under high temperature, low oxygen partial pressure conditions through selective oxidation.
Journal title
Journal of Nuclear Materials
Serial Year
2002
Journal title
Journal of Nuclear Materials
Record number
1356678
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