Title of article
Molecular dynamics simulations of CH3 sticking on carbon first wall structures
Author/Authors
Trنskelin، نويسنده , , P. and Salonen، نويسنده , , E. and Nordlund، نويسنده , , K. and Krasheninnikov، نويسنده , , A.V. and Keinonen، نويسنده , , J. and Wu، نويسنده , , C.H.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
52
To page
55
Abstract
Tight-binding molecular dynamics simulations were used to obtain sticking cross-sections for CH3 radical chemisorption on unsaturated carbon atom sites on carbon surfaces. Our results show that the chemisorption of a CH3 radical is affected both by the angle of incidence of the radical and the local atomic neighborhood of the dangling bond. The sticking cross-sections are compared with experimental results and the implications of our modeling on C:T film growth in fusion devices are discussed.
Keywords
sticking , Chemisorption , dangling bond , First wall , carbon , Methyl
Journal title
Journal of Nuclear Materials
Serial Year
2003
Journal title
Journal of Nuclear Materials
Record number
1356934
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