Title of article :
Molecular dynamics simulations of CH3 sticking on carbon first wall structures
Author/Authors :
Trنskelin، نويسنده , , P. and Salonen، نويسنده , , E. and Nordlund، نويسنده , , K. and Krasheninnikov، نويسنده , , A.V. and Keinonen، نويسنده , , J. and Wu، نويسنده , , C.H.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
52
To page :
55
Abstract :
Tight-binding molecular dynamics simulations were used to obtain sticking cross-sections for CH3 radical chemisorption on unsaturated carbon atom sites on carbon surfaces. Our results show that the chemisorption of a CH3 radical is affected both by the angle of incidence of the radical and the local atomic neighborhood of the dangling bond. The sticking cross-sections are compared with experimental results and the implications of our modeling on C:T film growth in fusion devices are discussed.
Keywords :
sticking , Chemisorption , dangling bond , First wall , carbon , Methyl
Journal title :
Journal of Nuclear Materials
Serial Year :
2003
Journal title :
Journal of Nuclear Materials
Record number :
1356934
Link To Document :
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