• Title of article

    Characteristics of lithium thin films under deuterium ion implantation

  • Author/Authors

    Furuyama، نويسنده , , Y. and Ito، نويسنده , , K. and Dohi، نويسنده , , S. and Taniike، نويسنده , , A. and Kitamura، نويسنده , , A.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    4
  • From page
    288
  • To page
    291
  • Abstract
    To clarify characteristics of thin Li films as a plasma facing material, effect of modification of chemical composition of μm-thick deposited Li films introduced during the sample preparation and implantation with 1-keV deuterons on deuterium retention and thermal desorption properties is studied. Accelerator analysis has been employed to measure the thickness, the retention of D, H, O and C in the Li film, while thermal desorption spectroscopy has been utilized to investigate the chemical composition. The Li films exposed to moist atmosphere and subjected to D implantation show almost perfect isotope exchange from LiOH to LiOD. Carbon deposition during ion implantation is found to form a layer mixed with Li. With increasing the deposited amount of C, D2 desorption behavior approaches that of pure C.
  • Keywords
    ERD , Carbon deposition , RBS , Li thin films , Deuterium implanation , Thermal desorption spectroscopy
  • Journal title
    Journal of Nuclear Materials
  • Serial Year
    2003
  • Journal title
    Journal of Nuclear Materials
  • Record number

    1356980