Title of article
Characteristics of lithium thin films under deuterium ion implantation
Author/Authors
Furuyama، نويسنده , , Y. and Ito، نويسنده , , K. and Dohi، نويسنده , , S. and Taniike، نويسنده , , A. and Kitamura، نويسنده , , A.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
288
To page
291
Abstract
To clarify characteristics of thin Li films as a plasma facing material, effect of modification of chemical composition of μm-thick deposited Li films introduced during the sample preparation and implantation with 1-keV deuterons on deuterium retention and thermal desorption properties is studied. Accelerator analysis has been employed to measure the thickness, the retention of D, H, O and C in the Li film, while thermal desorption spectroscopy has been utilized to investigate the chemical composition. The Li films exposed to moist atmosphere and subjected to D implantation show almost perfect isotope exchange from LiOH to LiOD. Carbon deposition during ion implantation is found to form a layer mixed with Li. With increasing the deposited amount of C, D2 desorption behavior approaches that of pure C.
Keywords
ERD , Carbon deposition , RBS , Li thin films , Deuterium implanation , Thermal desorption spectroscopy
Journal title
Journal of Nuclear Materials
Serial Year
2003
Journal title
Journal of Nuclear Materials
Record number
1356980
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